Exploring polysilicon deposition conditions through a laboratory CVD prototype

Ramos Cabal, Alba and Cañizo Nadal, Carlos del and Valdehita Torija, Javier and Zamorano Saavedra, Juan Carlos and Rodríguez Rodríguez, Araceli and Luque López, Antonio (2012). Exploring polysilicon deposition conditions through a laboratory CVD prototype. "Physica Status Solidi (C)", v. 9 (n. 10-11 ); pp. 2164-2168. ISSN 1610-1642. https://doi.org/10.1002/pssc.201200161.

Description

Title: Exploring polysilicon deposition conditions through a laboratory CVD prototype
Author/s:
  • Ramos Cabal, Alba
  • Cañizo Nadal, Carlos del
  • Valdehita Torija, Javier
  • Zamorano Saavedra, Juan Carlos
  • Rodríguez Rodríguez, Araceli
  • Luque López, Antonio
Item Type: Article
Título de Revista/Publicación: Physica Status Solidi (C)
Date: October 2012
ISSN: 1610-1642
Volume: 9
Subjects:
Freetext Keywords: Solar grade silicon; CVD process; trichlorosilane; mass spectrometry
Faculty: Instituto de Energía Solar (IES) (UPM)
Department: Otro
Creative Commons Licenses: Recognition - No derivative works - Non commercial

Full text

[img] PDF - Users in campus UPM only - Requires a PDF viewer, such as GSview, Xpdf or Adobe Acrobat Reader
Download (312kB)

Abstract

Cost and energy consumption related to obtaining polysilicon impact significantly on the total photovoltaic module cost and its energy payback time. Process simplifications can be performed, leading to cost reductions. Nowadays, among several approaches currently pursued to produce the so called Solar Grade Silicon, the chemical route, named Siemens process, is the dominant one. At the Instituto de Energía Solar research on this topic is focused on the chemical route, in particular on the polysilicon deposition step by chemical vapor deposition (CVD) from Trichlorosilane through a laboratory prototype. Valuable information about the phenomena involved in the polysilicon deposition process and the operating conditions is obtained from our experiments. A particular feature of our system is the inclusion of a mass spectrometer. The present work comprises spectra characterization of the polysilicon deposition chemical reaction, temperature and inlet gas mixture composition influence on the deposition rate and analysis of polysilicon deposition conditions for the ?pop-corn' phenomenon to appear, based on experimental experience (Actas de la Special Issue: E-MRS 2012 Spring Meeting ? Symposium A

More information

Item ID: 16561
DC Identifier: http://oa.upm.es/16561/
OAI Identifier: oai:oa.upm.es:16561
DOI: 10.1002/pssc.201200161
Official URL: http://onlinelibrary.wiley.com/doi/10.1002/pssc.201200161/abstract
Deposited by: Memoria Investigacion
Deposited on: 04 Aug 2013 10:41
Last Modified: 22 Sep 2014 11:13
  • Logo InvestigaM (UPM)
  • Logo GEOUP4
  • Logo Open Access
  • Open Access
  • Logo Sherpa/Romeo
    Check whether the anglo-saxon journal in which you have published an article allows you to also publish it under open access.
  • Logo Dulcinea
    Check whether the spanish journal in which you have published an article allows you to also publish it under open access.
  • Logo de Recolecta
  • Logo del Observatorio I+D+i UPM
  • Logo de OpenCourseWare UPM