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Band bending at In-rich InGaN surfaces

Bailey, L.R. and King, P.D.C. and Veal, T.D. and McConville, Chris F. and Pereiro Viterbo, Juan and Grandal Quintana, Javier and Sánchez García, Miguel Angel and Muñoz Merino, Elias and Calleja Pardo, Enrique (2008) Band bending at In-rich InGaN surfaces. Journal of Applied Physics, 104 (11). 113716-1 - 113716-6. ISSN 0021-8979

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Item Type:Article
Authors/Creators:
Creators NameCreators email (if known)
Bailey, L.R.
King, P.D.C.
Veal, T.D.
McConville, Chris F.
Pereiro Viterbo, Juan
Grandal Quintana, Javier
Sánchez García, Miguel Angel
Muñoz Merino, Elias
Calleja Pardo, Enrique
Title:Band bending at In-rich InGaN surfaces
Publisher:American Institute of Physics
Journal/Publication Title:Journal of Applied Physics
Date:January 2008
Volume:104
Number:11
Department:Electronic Engineering
Faculty:E.T.S.I. Telecommunication (UPM)
Creative Commons licenses:Recognition - No derivative works - No commercial
Item ID:2548
Subjects:Telecommunications
Electronics
Materials

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Official URL: http://jap.aip.org/japiau/v104/i11

Abstract

The band bending and carrier concentration profiles as a function of depth below the surface for oxidized InxGa1−xN alloys with a composition range of 0.39 ≤ x ≤ 1.00 are investigated using x-ray photoelectron, infrared reflection, and optical absorption spectroscopies, and solutions of Poisson’s equation within a modified Thomas–Fermi approximation. All of these InGaN samples exhibit downward band bending ranging from 0.19 to 0.66 eV and a high surface sheet charge density ranging from 5.0×1012 to 1.5×1013 cm−2. The downward band bending is more pronounced in the most In-rich InGaN samples, resulting in larger near-surface electron concentrations.

Item Type:Article
Subjects:Telecommunications
Electronics
Materials
Código ID:2548
Depositado Por:Memoria Investigacion
Depositado el:15 Mar 2010 10:46
Last Modified:15 Mar 2010 10:46

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