Design and manufacturing of integrated optical devices in visible spectrum = Diseño y fabricación de dispositivos integrados de guías de onda en espectro visible

Gordo Quiroga, Fernando José (2016). Design and manufacturing of integrated optical devices in visible spectrum = Diseño y fabricación de dispositivos integrados de guías de onda en espectro visible. Proyecto Fin de Carrera / Trabajo Fin de Grado, E.T.S.I. Telecomunicación (UPM), Madrid.

Description

Title: Design and manufacturing of integrated optical devices in visible spectrum = Diseño y fabricación de dispositivos integrados de guías de onda en espectro visible
Author/s:
  • Gordo Quiroga, Fernando José
Contributor/s:
  • Caño García, Manuel
Item Type: Final Project
Degree: Grado en Ingeniería de Tecnologías y Servicios de Telecomunicación
Date: 2016
Subjects:
Freetext Keywords: photonic integrated circuit, optical waveguide, photolithography, SU-8.
Faculty: E.T.S.I. Telecomunicación (UPM)
Department: Tecnología Fotónica y Bioingeniería
Creative Commons Licenses: Recognition - No derivative works - Non commercial

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Abstract

In this project we aim at addressing the study of the full manufacturing process of a photonic integrated circuit, from the initial stage of components design to the tests required to ensure its proper functioning. Its most innovative aspect compared to the existing technology is that the wavelength used belongs to the visible light spectrum. Thus the dimensions of the waveguides have to be significantly reduced. For this reason, the analysis of new manufacturing protocols, using new materials and new techniques, is required. In addition, the current methods will be also modified in order to be optimized for our scenario. In a first step, design and simulation of the desired devices were conducted so that a set of different configurations can be approached. After that, the integration of the maximum number of these configurations was settled in a chromium mask design. This mask was then used in the photolithography process to harden SU-8 photoresist over a silicon substrate. Good fabrication results were obtained, being able to reach waveguides structures of 0.5 μm thick and 1.5 μm wide. The final chips were characterized in a dark room with two different laser input and proper light guidance was demonstrated as well as output switching.

More information

Item ID: 43402
DC Identifier: http://oa.upm.es/43402/
OAI Identifier: oai:oa.upm.es:43402
Deposited by: Biblioteca ETSI Telecomunicación
Deposited on: 28 Sep 2016 08:26
Last Modified: 28 Sep 2016 08:26
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