Monte Carlo-based tolerance study of an end-fed resonant slotted waveguide linear array antenna

Ripoll Solano, Lácides and Torres Herrera, Luis and Sierra Pérez, Manuel (2017). Monte Carlo-based tolerance study of an end-fed resonant slotted waveguide linear array antenna. In: "CHILEAN Conference on Electrical, Electronics Engineering, Information and Communication Technologies (CHILECON 2017)", 18/10/2017 - 2010/2017, Pucon, Chile. pp. 1-6. https://doi.org/10.1109/CHILECON.2017.8229586.

Description

Title: Monte Carlo-based tolerance study of an end-fed resonant slotted waveguide linear array antenna
Author/s:
  • Ripoll Solano, Lácides
  • Torres Herrera, Luis
  • Sierra Pérez, Manuel
Item Type: Presentation at Congress or Conference (Article)
Event Title: CHILEAN Conference on Electrical, Electronics Engineering, Information and Communication Technologies (CHILECON 2017)
Event Dates: 18/10/2017 - 2010/2017
Event Location: Pucon, Chile
Title of Book: CHILEAN Conference on Electrical, Electronics Engineering, Information and Communication Technologies (CHILECON 2017)
Date: 2017
Subjects:
Freetext Keywords: Antenna, slot, resonant, waveguide, tolerance, Monte Carlo
Faculty: E.T.S.I. Telecomunicación (UPM)
Department: Señales, Sistemas y Radiocomunicaciones
Creative Commons Licenses: Recognition - No derivative works - Non commercial

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Abstract

This article presents a Monte Carlo?based analysis of the effects that random manufacturing errors produce on the radiation diagram of resonant slotted waveguide linear antennas. Positional and dimensional errors on the slots are considered. The study is performed using a tool implemented in MATLAB based on the Taylor synthesis of antenna parameters and the analysis of arrays and aperture models. The tool assesses the impact of the different errors on the radiation pattern. The results show that slot dimension errors have a dominant effect on the pattern over the variation on the slot position in the waveguide. A prototype of the studied antenna was build and its radiation pattern measured against the predicted mean and extreme tolerance margins. The results obtained are satisfactory, thus validating the implemented tool.

More information

Item ID: 50574
DC Identifier: http://oa.upm.es/50574/
OAI Identifier: oai:oa.upm.es:50574
DOI: 10.1109/CHILECON.2017.8229586
Official URL: https://ieeexplore.ieee.org/document/8229586/
Deposited by: Memoria Investigacion
Deposited on: 28 May 2018 15:55
Last Modified: 28 May 2018 15:55
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