Export: Chemical Vapor Deposition Model of Polysilicon in a Trichlorosilane and Hydrogen System

Coso Sánchez, Gonzalo del and Cañizo Nadal, Carlos del and Luque López, Antonio (2008). Chemical Vapor Deposition Model of Polysilicon in a Trichlorosilane and Hydrogen System. "Journal of The Electrochemical Society", v. 155 (n. 6); pp.. ISSN 0013-4651. https://doi.org/10.1149/1.2902338.

Please select an output format:

  • Logo InvestigaM (UPM)
  • Logo GEOUP4
  • Logo Open Access
  • Open Access
  • Logo Sherpa/Romeo
    Check whether the anglo-saxon journal in which you have published an article allows you to also publish it under open access.
  • Logo Dulcinea
    Check whether the spanish journal in which you have published an article allows you to also publish it under open access.
  • Logo de Recolecta
  • Logo del Observatorio I+D+i UPM
  • Logo de OpenCourseWare UPM