Export: Microstructure and mechanical properties of physical vapor deposited Cu/W nanoscale multilayers: Influence of layer thickness and temperature

Monclús, M. A. and Karlik, M. and Callisti, M. and Frutos, E. and Llorca Martinez, Francisco Javier and Polcar, T. and Molina Aldareguía, Jon M. (2014). Microstructure and mechanical properties of physical vapor deposited Cu/W nanoscale multilayers: Influence of layer thickness and temperature. "Thin Solid Films", v. 571 ; pp. 275-282. ISSN 0040-6090. https://doi.org/10.1016/j.tsf.2014.05.044.

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