Fabrication process of Mo/Au TES at RT

Fernández Martínez, Ivan, Parra Borderías, Maria, Gil, Oscar, Camón, Agustin, Fábrega, Lourdes, Costa Krämer, Jose L., Gonzalez Arrabal, Raquel ORCID: https://orcid.org/0000-0002-4955-1925, Sesé, Javier and Briones Fernández-Pola, Fernando (2011). Fabrication process of Mo/Au TES at RT. In: "14th International Workshop on Low Temperature Detectors", 01/08/2011 - 05/08/2011, Heidelberg, Alemania.


Title: Fabrication process of Mo/Au TES at RT
  • Fernández Martínez, Ivan
  • Parra Borderías, Maria
  • Gil, Oscar
  • Camón, Agustin
  • Fábrega, Lourdes
  • Costa Krämer, Jose L.
  • Gonzalez Arrabal, Raquel https://orcid.org/0000-0002-4955-1925
  • Sesé, Javier
  • Briones Fernández-Pola, Fernando
Item Type: Presentation at Congress or Conference (Poster)
Event Title: 14th International Workshop on Low Temperature Detectors
Event Dates: 01/08/2011 - 05/08/2011
Event Location: Heidelberg, Alemania
Title of Book: Proceedings of 14th International Workshop on Low Temperature Detectors???
Date: 2011
Faculty: E.T.S.I. Industriales (UPM)
Department: Ingeniería Nuclear [hasta 2014]
Creative Commons Licenses: Recognition - No derivative works - Non commercial

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We report on the fabrication details of TES based on Mo/Au bilayers. The Mo layer is deposited by radio frequency (RF) sputtering and capped with a sputter deposited thin Au protection layer. Afterwards, a second Au layer of suitable (lower) resistivity is deposited ex‐situ by e‐beam evaporation, until completion of the total desired Au thickness. The deposition was performed at room temperature (RT) on LPCVD Si3 N4 membranes. Such a deposition procedure is very reproducible and allow controlling the critical temperature (Tc) and normal electrical resistance (RN ) of the Mo/Au bilayer. The process is optimized to achieve low stress bilayers, thus avoiding the undesirable curvature of the membranes. Bilayers are patterned using photolithographic techniques and wet etching procedures. Mo superconducting paths are used to contact the Mo/Au bilayers, thus ensuring good electrical conductivity and thermal isolation. The entire fabrication process let to stable and reproducible sensors with required and tunable functional properties

More information

Item ID: 12500
DC Identifier: https://oa.upm.es/12500/
OAI Identifier: oai:oa.upm.es:12500
Deposited by: Memoria Investigacion
Deposited on: 18 Dec 2012 11:10
Last Modified: 21 Apr 2016 11:45
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