Diffusion of Zn into GaAs and AlGaAs from isothermal Liquid-phase epitaxy solutions

Martí Vega, Antonio ORCID: https://orcid.org/0000-0002-8841-7091, Algora del Valle, Carlos ORCID: https://orcid.org/0000-0003-1872-7243 and Lopez Araujo, Gerardo (1990). Diffusion of Zn into GaAs and AlGaAs from isothermal Liquid-phase epitaxy solutions. "Journal of Applied Physics", v. 37 (n. 5); pp. 2723-2730. ISSN 0021-8979. https://doi.org/10.1063/1.346447.

Description

Title: Diffusion of Zn into GaAs and AlGaAs from isothermal Liquid-phase epitaxy solutions
Author/s:
Item Type: Article
Título de Revista/Publicación: Journal of Applied Physics
Date: 1990
ISSN: 0021-8979
Volume: 37
Subjects:
Faculty: E.T.S.I. Telecomunicación (UPM)
Department: Electrónica Física
Creative Commons Licenses: Recognition - No derivative works - Non commercial

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Abstract

In this work we present results of zinc diffusion in GaAs using the liquid phase epitaxy technique from liquid solutions of Ga‐As‐Zn and Ga‐As‐Al‐Zn. Using silicon‐doped n‐GaAs substrates, working at a diffusion temperature of 850 °C, and introducing a dopant concentration ranging 1018–1019 cm−3, the most important findings regarding the diffusion properties are as follows: (a) zinc concentration in the solid depends on the square root of zinc atomic fraction in the liquid; (b) the diffusion is dominated by the interstitial‐substitutional process; (c) the diffusivity D varies as about C3 in the form D=2.9×10−67C3.05; (d) aluminum plays the role of the catalyst of the diffusion process, if it is introduced in the liquid solution, since it is found that D varies as (γAsXlAs)−1; (e) the zinc interstitial is mainly doubly ionized (Zn++i); (f) the zinc diffusion coefficient in Al0.85 Ga0.15 As is about four times greater than in GaAs; (g) by means of all these results, it is possible to control zinc diffusion processes in order to obtain optimized depth junctions and doping levels in semiconductor device fabrication.

More information

Item ID: 13909
DC Identifier: https://oa.upm.es/13909/
OAI Identifier: oai:oa.upm.es:13909
DOI: 10.1063/1.346447
Official URL: http://jap.aip.org/resource/1/japiau/v68/i6/p2723_...
Deposited by: Memoria Investigacion
Deposited on: 22 Feb 2013 11:14
Last Modified: 21 Apr 2016 13:20
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