Full text
Preview |
PDF
- Requires a PDF viewer, such as GSview, Xpdf or Adobe Acrobat Reader
Download (2MB) | Preview |
Low-thickness high-quality aluminum nitride films for super high frequency solidly mounted resonators
Citation
Iborra Grau, Enrique 
ORCID: https://orcid.org/0000-0002-1385-1379, Clement Lorenzo, Marta ORCID: https://orcid.org/0000-0003-4956-8206, Capilla Osorio, José, Olivares Roza, Jimena ORCID: https://orcid.org/0000-0003-4396-4363 and Felmetsger, Valeriy
(2012).
Low-thickness high-quality aluminum nitride films for super high frequency solidly mounted resonators.
"THIN SOLID FILMS", v. 520
(n. 7);
pp. 3060-3063.
ISSN 0040-6090.
https://doi.org/10.1016/j.tsf.2011.11.007.
Description
| Title: | Low-thickness high-quality aluminum nitride films for super high frequency solidly mounted resonators |
|---|---|
| Author/s: |
|
| Item Type: | Article |
| Título de Revista/Publicación: | THIN SOLID FILMS |
| Date: | January 2012 |
| ISSN: | 0040-6090 |
| Volume: | 520 |
| Subjects: | |
| Freetext Keywords: | Piezoelectric AlN; Crystal quality; AC reactive sputtering; Two-step deposition; High frequency solidly mounted resonator; Electromechanical coupling factor; Quality factor |
| Faculty: | E.T.S.I. Telecomunicación (UPM) |
| Department: | Tecnología Electrónica [hasta 2014] |
| Creative Commons Licenses: | Recognition - No derivative works - Non commercial |
Abstract
We investigate the sputter growth of very thin aluminum nitride (AlN) films on iridium electrodes for electroacoustic devices operating in the super high frequency range. Superior crystal quality and low stress films with thicknesses as low as 160 nm are achieved after a radio frequency plasma treatment of the iridium electrode followed by a two-step alternating current reactive magnetron sputtering of an aluminum target, which promotes better conditions for the nucleation of well textured AlN films in the very first stages of growth. Solidly mounted resonators tuned around 8 GHz with effective electromechanical coupling factors of 5.8% and quality factors Q up to 900 are achieved.
More information
| Item ID: | 15682 |
|---|---|
| DC Identifier: | https://oa.upm.es/15682/ |
| OAI Identifier: | oai:oa.upm.es:15682 |
| DOI: | 10.1016/j.tsf.2011.11.007 |
| Official URL: | http://www.sciencedirect.com/science/article/pii/S... |
| Deposited by: | Memoria Investigacion |
| Deposited on: | 16 Jun 2013 11:29 |
| Last Modified: | 21 Apr 2016 15:56 |
