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Capilla Osorio, José and Olivares Roza, Jimena and Clement Lorenzo, Marta and Sangrador García, Jesús and Iborra Grau, Enrique and Devos, Arnaud (2012). High-Acoustic-Impedance Tantalum Oxide Layers for Insulating Acoustic Reflectors. "IEEE Transactions on Ultrasonics Ferroelectrics and Frequency", v. 59 (n. 3); pp. 366-372. ISSN 0885-3010. https://doi.org/10.1109/TUFFC.2012.2205.
Title: | High-Acoustic-Impedance Tantalum Oxide Layers for Insulating Acoustic Reflectors |
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Author/s: |
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Item Type: | Article |
Título de Revista/Publicación: | IEEE Transactions on Ultrasonics Ferroelectrics and Frequency |
Date: | March 2012 |
ISSN: | 0885-3010 |
Volume: | 59 |
Subjects: | |
Faculty: | E.T.S.I. Telecomunicación (UPM) |
Department: | Tecnología Electrónica [hasta 2014] |
Creative Commons Licenses: | Recognition - No derivative works - Non commercial |
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This work describes the assessment of the acoustic properties of sputtered tantalum oxide films intended for use as high-impedance films of acoustic reflectors for solidly mounted resonators operating in the gigahertz frequency range. The films are grown by sputtering a metallic tantalum target under different oxygen and argon gas mixtures, total pressures, pulsed dc powers, and substrate biases. The structural properties of the films are assessed through infrared absorption spectroscopy and X-ray diffraction measurements. Their acoustic impedance is assessed by deriving the mass density from X-ray reflectometry measurements and the acoustic velocity from picosecond acoustic spectroscopy and the analysis of the frequency response of the test resonators.
Item ID: | 15683 |
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DC Identifier: | https://oa.upm.es/15683/ |
OAI Identifier: | oai:oa.upm.es:15683 |
DOI: | 10.1109/TUFFC.2012.2205 |
Official URL: | http://ieeexplore.ieee.org/stamp/stamp.jsp?arnumbe... |
Deposited by: | Memoria Investigacion |
Deposited on: | 17 Jun 2013 16:34 |
Last Modified: | 21 Apr 2016 15:56 |