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Angulo Barrios, Carlos and Carrasco, S. and Canalejas Tejero, Victor and López-Romero Moraleda, David and Navarro Villoslada, Fernando and Moreno-Bondi, M.C. and García Fierro, José Luis and Capel Sánchez, M.C. (2012). Fabrication of luminescent nanostructures by electron-beam direct writing of PMMA resist. "Materials Letters", v. 88 ; pp. 93-96. ISSN 0167-577X. https://doi.org/10.1016/j.matlet.2012.08.035.
Title: | Fabrication of luminescent nanostructures by electron-beam direct writing of PMMA resist |
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Author/s: |
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Item Type: | Article |
Título de Revista/Publicación: | Materials Letters |
Date: | December 2012 |
ISSN: | 0167-577X |
Volume: | 88 |
Subjects: | |
Freetext Keywords: | Organic luminiscent films; Nanophotonics; Nanotechnology; Electron-beam lithography; Organic resists; Poly(methylmethacrylate) |
Faculty: | Instituto de Sistemas Optoelectrónicos y Microtecnología (ISOM) (UPM) |
Department: | Otro |
Creative Commons Licenses: | Recognition - No derivative works - Non commercial |
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We report on the conversion of non-luminescent conventional poly(methylmethacrylate) (PMMA)-based electron-beam resists into luminescent materials when used as negative-tone resists, that is, when exposed to high electron irradiation doses. Raman spectroscopy reveals the chemical transformation induced by electron irradiation which is responsible for the observed luminescence in the visible (blue) region. The emission intensity from exposed PMMA-based patterns can be controlled by the electron irradiation dose employed to create them.
Item ID: | 15762 |
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DC Identifier: | https://oa.upm.es/15762/ |
OAI Identifier: | oai:oa.upm.es:15762 |
DOI: | 10.1016/j.matlet.2012.08.035 |
Official URL: | http://www.sciencedirect.com/science/article/pii/S0167577X12011457 |
Deposited by: | Memoria Investigacion |
Deposited on: | 22 Jul 2013 18:59 |
Last Modified: | 01 Jan 2015 23:56 |