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Gacevic, Zarko and Gómez Hernández, Víctor Jesús and García Lepetit, Noemí and Soto Rodríguez, Paul and Bengoechea Encabo, Ana and Fernández Garrido, Sergio and Nötzel, R. and Calleja Pardo, Enrique (2013). A comprehensive diagram to grow metal-polarity InGaN alloys by molecular beam epitaxy. "Journal of Crystal Growth", v. 364 ; pp. 123-127. ISSN 0003-6951. https://doi.org/10.1016/j.jcrysgro.2012.11.031.
Title: | A comprehensive diagram to grow metal-polarity InGaN alloys by molecular beam epitaxy |
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Author/s: |
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Item Type: | Article |
Título de Revista/Publicación: | Journal of Crystal Growth |
Date: | February 2013 |
ISSN: | 0003-6951 |
Volume: | 364 |
Subjects: | |
Freetext Keywords: | A1. Composition; A1. Growth diagram; A1. Strain; A1. Surface morphology; A3. Molecular beam; B1. InGaN |
Faculty: | E.T.S.I. Telecomunicación (UPM) |
Department: | Ingeniería Electrónica |
Creative Commons Licenses: | Recognition - No derivative works - Non commercial |
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he composition, strain and surface morphology of (0001)InGaN layers are investigated as a function of growth temperature (460–645 °C) and impinging In flux. Three different growth regimes: nitrogen-rich, metal-rich and intermediate metal-rich, are clearly identified and found to be in correlation with surface morphology and strain relaxation. Best epilayers’ quality is obtained when growing under intermediate metal-rich conditions, with 1–2 monolayers thick In ad-coverage. For a given In flux, the In incorporation decreases with increasing growth temperature due to InN thermal decomposition that follows an Arrhenius behavior with 1.84±0.12 eV activation energy.
Type | Code | Acronym | Leader | Title |
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Government of Spain | MAT2008–04815 | Unspecified | Unspecified | Unspecified |
Madrid Regional Government | P2009/ESP-1503 | Unspecified | Unspecified | Unspecified |
Item ID: | 22671 |
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DC Identifier: | https://oa.upm.es/22671/ |
OAI Identifier: | oai:oa.upm.es:22671 |
DOI: | 10.1016/j.jcrysgro.2012.11.031 |
Official URL: | http://www.sciencedirect.com/science/article/pii/S0022024812008287 |
Deposited by: | Memoria Investigacion |
Deposited on: | 16 Mar 2014 11:02 |
Last Modified: | 30 Nov 2022 09:00 |