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Ratio-based temperature-sensing technique hardened against nanometer process variations
Citation
Ituero Herrero, Pablo 
ORCID: https://orcid.org/0000-0001-6448-7936 and López Vallejo, Marisa ORCID: https://orcid.org/0000-0002-3833-524X
(2013).
Ratio-based temperature-sensing technique hardened against nanometer process variations.
"IEEE Sensors Journal", v. 13
(n. 2);
pp. 442-443.
ISSN 1530-437X.
https://doi.org/10.1109/JSEN.2012.2227713.
Description
| Title: | Ratio-based temperature-sensing technique hardened against nanometer process variations |
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| Author/s: |
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| Item Type: | Article |
| Título de Revista/Publicación: | IEEE Sensors Journal |
| Date: | February 2013 |
| ISSN: | 1530-437X |
| Volume: | 13 |
| Subjects: | |
| Freetext Keywords: | Leakage, process variations, ratio-based, sensor, temperature, time-to-digital |
| Faculty: | E.T.S.I. Telecomunicación (UPM) |
| Department: | Ingeniería Electrónica |
| Creative Commons Licenses: | Recognition - No derivative works - Non commercial |
Abstract
This letter presents a temperature-sensing technique on the basis of the temperature dependency of MOSFET leakage currents. To mitigate the effects of process variation, the ratio of two different leakage current measurements is calculated. Simulations show that this ratio is robust to process spread. The resulting sensor is quite small-0.0016 mm2 including an analog-to-digital conversion-and very energy efficient, consuming less than 640 pJ/conversion. After a two-point calibration, the accuracy in a range of 40°C-110°C is less than 1.5°C , which makes the technique suitable for thermal management applications.
More information
| Item ID: | 29554 |
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| DC Identifier: | https://oa.upm.es/29554/ |
| OAI Identifier: | oai:oa.upm.es:29554 |
| DOI: | 10.1109/JSEN.2012.2227713 |
| Official URL: | http://ieeexplore.ieee.org/xpl/articleDetails.jsp?... |
| Deposited by: | Memoria Investigacion |
| Deposited on: | 06 Jul 2014 10:26 |
| Last Modified: | 21 Apr 2016 23:57 |
