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Reactive sputtering of AlScN thin Ulms with variable Sc content on 200 mm wafers
Citation
Clement Lorenzo, Marta 
ORCID: https://orcid.org/0000-0003-4956-8206, Felmetsger, Valeriy, Mirea, Teona ORCID: https://orcid.org/0000-0003-2324-4895 and Iborra Grau, Enrique ORCID: https://orcid.org/0000-0002-1385-1379
(2018).
Reactive sputtering of AlScN thin Ulms with variable Sc content on 200 mm wafers.
In: "European Frequency and Time Forum (EFTF 2018)", 10/04/2018 - 12/042018, Turin, Italy. pp. 1-4.
https://doi.org/10.1109/EFTF.2018.8408987.
Description
| Title: | Reactive sputtering of AlScN thin Ulms with variable Sc content on 200 mm wafers |
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| Author/s: |
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| Item Type: | Presentation at Congress or Conference (Article) |
| Event Title: | European Frequency and Time Forum (EFTF 2018) |
| Event Dates: | 10/04/2018 - 12/042018 |
| Event Location: | Turin, Italy |
| Title of Book: | European Frequency and Time Forum (EFTF 2018) |
| Date: | 2018 |
| Subjects: | |
| Freetext Keywords: | AlScN films; 200 mm silicon sustrates; variation of Sc content |
| Faculty: | E.T.S.I. Telecomunicación (UPM) |
| Department: | Ingeniería Electrónica |
| Creative Commons Licenses: | Recognition - No derivative works - Non commercial |
Abstract
Sc-doped AlN polycrystalline films are attractive active layers for high frequency (GHz range) acoustic resonators owing to the significant enlargement of the AlN piezoelectric activity with the increasing Sc content. To sputter homogenously doped AlScN films on 200 mm Si wafers we use a configurable cathode containing a variable number of embedded Sc pellets to fine tuning the Sc content in the films. The method was implemented in an Endeavor-AT™ cluster tool from OEM Group, adapted for sputtering on 200 mm wafers. 1 µm thick AlScN films with uniform Sc content (around 7 at.%), high crystal quality and good piezoelectric response have been sputtered over 200 mm production-level wafers.
More information
| Item ID: | 55094 |
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| DC Identifier: | https://oa.upm.es/55094/ |
| OAI Identifier: | oai:oa.upm.es:55094 |
| DOI: | 10.1109/EFTF.2018.8408987 |
| Official URL: | https://ieeexplore.ieee.org/document/8408987 |
| Deposited by: | Memoria Investigacion |
| Deposited on: | 27 May 2019 14:31 |
| Last Modified: | 27 May 2019 14:31 |
