@inproceedings{upm4402,
            year = {2008},
       publisher = {Materials Research Society},
       booktitle = {Amorphous and Polycristalline Silicon Science and Technology 2008},
         address = {EEUU},
          volume = {1066},
           title = {Nanostructures with Group IV nanocrystals obtained by LPCVD and thermal annealing of SiGeO layers},
          author = {Morana, B. and Rodr{\'i}guez Dom{\'i}nguez, Andr{\'e}s and Sangrador Garc{\'i}a, Jes{\'u}s and Rodr{\'i}guez Rodr{\'i}guez, Tom{\'a}s and Mart{\'i}nez de Quel P{\'e}rez, {\'O}scar and Jim{\'e}nez Leube, Francisco Javier and Kling, Andreas},
        abstract = {Nanocrystals embedded in an oxide matrix have been fabricated by annealing SiGeO films deposited by LPCVD. The composition of the oxide layers and its evolution after annealing as well as the presence and nature of nanocrystals in the films have been studied by several experimental techniques. The results are analyzed and discussed in terms of the main deposition parameters and the annealing temperature.},
             url = {http://www.mrs.org/s\%5fmrs/sec.asp?CID=13907&DID=209198}
}