%A B. Morana
%A Andrés Rodríguez Domínguez
%A Jesús Sangrador García
%A Tomás Rodríguez Rodríguez
%A Óscar Martínez de Quel Pérez
%A Francisco Javier Jiménez Leube
%A Andreas Kling
%C EEUU
%I Materials Research Society
%X Nanocrystals embedded in an oxide matrix have been fabricated by annealing SiGeO films deposited by LPCVD. The composition of the oxide layers and its evolution after annealing as well as the presence and nature of nanocrystals in the films have been studied by several experimental techniques. The results are analyzed and discussed in terms of the main deposition parameters and the annealing temperature.
%D 2008
%L upm4402
%V 1066
%T Nanostructures with Group IV nanocrystals obtained by LPCVD and thermal annealing of SiGeO layers
%B Amorphous and Polycristalline Silicon Science and Technology 2008