Self-validating technique for the measurement of the linewidth enhancement factor in semiconductor lasers

Consoli Barone, Antonio (2011). Self-validating technique for the measurement of the linewidth enhancement factor in semiconductor lasers. "Optics Express", v. 20 (n. 5); pp. 4979-4987. ISSN 1094-4087. https://doi.org/10.1364/OE.20.004979.

Description

Title: Self-validating technique for the measurement of the linewidth enhancement factor in semiconductor lasers
Author/s:
  • Consoli Barone, Antonio
Item Type: Article
Título de Revista/Publicación: Optics Express
Date: 2011
ISSN: 1094-4087
Volume: 20
Subjects:
Faculty: E.T.S.I. Telecomunicación (UPM)
Department: Tecnología Fotónica [hasta 2014]
Creative Commons Licenses: Recognition - No derivative works - Non commercial

Full text

[img]
Preview
PDF - Requires a PDF viewer, such as GSview, Xpdf or Adobe Acrobat Reader
Download (765kB) | Preview

Abstract

A new method for measuring the linewidth enhancement factor (α-parameter) of semiconductor lasers is proposed and discussed. The method itself provides an estimation of the measurement error, thus self-validating the entire procedure. The α-parameter is obtained from the temporal profile and the instantaneous frequency (chirp) of the pulses generated by gain switching. The time resolved chirp is measured with a polarization based optical differentiator. The accuracy of the obtained values of the α-parameter is estimated from the comparison between the directly measured pulse spectrum and the spectrum reconstructed from the chirp and the temporal profile of the pulse. The method is applied to a VCSEL and to a DFB laser emitting around 1550 nm at different temperatures, obtaining a measurement error lower than ± 8%.

More information

Item ID: 12166
DC Identifier: http://oa.upm.es/12166/
OAI Identifier: oai:oa.upm.es:12166
DOI: 10.1364/OE.20.004979
Deposited by: Memoria Investigacion
Deposited on: 05 Sep 2012 10:45
Last Modified: 21 Apr 2016 11:22
  • Logo InvestigaM (UPM)
  • Logo GEOUP4
  • Logo Open Access
  • Open Access
  • Logo Sherpa/Romeo
    Check whether the anglo-saxon journal in which you have published an article allows you to also publish it under open access.
  • Logo Dulcinea
    Check whether the spanish journal in which you have published an article allows you to also publish it under open access.
  • Logo de Recolecta
  • Logo del Observatorio I+D+i UPM
  • Logo de OpenCourseWare UPM