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High-Acoustic-Impedance Tantalum Oxide Layers for Insulating Acoustic Reflectors
Cita
Capilla Osorio, José, Olivares Roza, Jimena 
ORCID: https://orcid.org/0000-0003-4396-4363, Clement Lorenzo, Marta ORCID: https://orcid.org/0000-0003-4956-8206, Sangrador García, Jesús ORCID: https://orcid.org/0000-0001-9582-8692, Iborra Grau, Enrique ORCID: https://orcid.org/0000-0002-1385-1379 and Devos, Arnaud
(2012).
High-Acoustic-Impedance Tantalum Oxide Layers for Insulating Acoustic Reflectors.
"IEEE Transactions on Ultrasonics Ferroelectrics and Frequency", v. 59
(n. 3);
pp. 366-372.
ISSN 0885-3010.
https://doi.org/10.1109/TUFFC.2012.2205.
ORCID: https://orcid.org/0000-0003-4396-4363, Clement Lorenzo, Marta ORCID: https://orcid.org/0000-0003-4956-8206, Sangrador García, Jesús ORCID: https://orcid.org/0000-0001-9582-8692, Iborra Grau, Enrique ORCID: https://orcid.org/0000-0002-1385-1379 and Devos, Arnaud
(2012).
High-Acoustic-Impedance Tantalum Oxide Layers for Insulating Acoustic Reflectors.
"IEEE Transactions on Ultrasonics Ferroelectrics and Frequency", v. 59
(n. 3);
pp. 366-372.
ISSN 0885-3010.
https://doi.org/10.1109/TUFFC.2012.2205.
Descripción
| Título: | High-Acoustic-Impedance Tantalum Oxide Layers for Insulating Acoustic Reflectors |
|---|---|
| Autor/es: |
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| Tipo de Documento: | Artículo |
| Título de Revista/Publicación: | IEEE Transactions on Ultrasonics Ferroelectrics and Frequency |
| Fecha: | Marzo 2012 |
| ISSN: | 0885-3010 |
| Volumen: | 59 |
| Número: | 3 |
| Materias: | |
| ODS: | |
| Escuela: | E.T.S.I. Telecomunicación (UPM) |
| Departamento: | Tecnología Electrónica [hasta 2014] |
| Licencias Creative Commons: | Reconocimiento - Sin obra derivada - No comercial |
Resumen
This work describes the assessment of the acoustic properties of sputtered tantalum oxide films intended for use as high-impedance films of acoustic reflectors for solidly mounted resonators operating in the gigahertz frequency range. The films are grown by sputtering a metallic tantalum target under different oxygen and argon gas mixtures, total pressures, pulsed dc powers, and substrate biases. The structural properties of the films are assessed through infrared absorption spectroscopy and X-ray diffraction measurements. Their acoustic impedance is assessed by deriving the mass density from X-ray reflectometry measurements and the acoustic velocity from picosecond acoustic spectroscopy and the analysis of the frequency response of the test resonators.
Más información
| ID de Registro: | 15683 |
|---|---|
| Identificador DC: | https://oa.upm.es/15683/ |
| Identificador OAI: | oai:oa.upm.es:15683 |
| URL Portal Científico: | https://portalcientifico.upm.es/es/ipublic/item/5487030 |
| Identificador DOI: | 10.1109/TUFFC.2012.2205 |
| URL Oficial: | http://ieeexplore.ieee.org/stamp/stamp.jsp?arnumbe... |
| Depositado por: | Memoria Investigacion |
| Depositado el: | 17 Jun 2013 16:34 |
| Ultima Modificación: | 12 Nov 2025 00:00 |
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