Optoelectronic Properties of InAlN/GaN Distributed Bragg Reflector Heterostructure Examined by Valence

Eljarrat, A., Estradé, S., Gacevic, Zarko ORCID: https://orcid.org/0000-0003-0552-2169, Fernández-Garrido, Sergio, Calleja Pardo, Enrique ORCID: https://orcid.org/0000-0002-3686-8982, Magén, C. and Peiró, F. (2012). Optoelectronic Properties of InAlN/GaN Distributed Bragg Reflector Heterostructure Examined by Valence. "Microscopy and Microanalysis", v. 18 ; pp. 1143-1154. ISSN 1431-9276. https://doi.org/10.1017/S1431927612001328.

Descripción

Título: Optoelectronic Properties of InAlN/GaN Distributed Bragg Reflector Heterostructure Examined by Valence
Autor/es:
Tipo de Documento: Artículo
Título de Revista/Publicación: Microscopy and Microanalysis
Fecha: 2012
ISSN: 1431-9276
Volumen: 18
Materias:
ODS:
Palabras Clave Informales: VEELS, optical properties, III-V nitrides, Kramers-Kronig analysis, band gap
Escuela: E.T.S.I. Telecomunicación (UPM)
Departamento: Ingeniería Electrónica
Licencias Creative Commons: Reconocimiento - Sin obra derivada - No comercial

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Resumen

High-resolution monochromated electron energy loss spectroscopy (EELS) at subnanometric spatial resolution and <200 meV energy resolution has been used to assess the valence band properties of a distributed Bragg reflector multilayer heterostructure composed of InAlN lattice matched to GaN. This work thoroughly presents the collection of methods and computational tools put together for this task. Among these are zero-loss-peak subtraction and nonlinear fitting tools, and theoretical modeling of the electron scattering distribution. EELS analysis allows retrieval of a great amount of information: indium concentration in the InAlN layers is monitored through the local plasmon energy position and calculated using a bowing parameter version of Vegard Law. Also a dielectric characterization of the InAlN and GaN layers has been performed through Kramers-Kronig analysis of the Valence-EELS data, allowing band gap energy to be measured and an insight on the polytypism of the GaN layers.

Más información

ID de Registro: 16339
Identificador DC: https://oa.upm.es/16339/
Identificador OAI: oai:oa.upm.es:16339
URL Portal Científico: https://portalcientifico.upm.es/es/ipublic/item/4170374
Identificador DOI: 10.1017/S1431927612001328
Depositado por: Memoria Investigacion
Depositado el: 13 Jul 2013 12:27
Ultima Modificación: 12 Nov 2025 00:00