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ORCID: https://orcid.org/0000-0001-8851-1777, Sangrador García, Jesús
ORCID: https://orcid.org/0000-0001-9582-8692, Ortiz Esteban, María Isabel, Rodríguez Rodríguez, Tomás
ORCID: https://orcid.org/0000-0002-4779-5862, Ballesteros Pérez, Carmen Inés and Soares, J.C.
(2008).
Combined grazing incidence RBS and TEM analysis of luminescent nano-SiGe/SiO2 multilayers..
"Nuclear Instruments and Methods in Physics Research Section B-Beam Interaction", v. 266
(n. 8);
pp. 1397-1401.
ISSN 0168-583X.
https://doi.org/10.1016/j.nimb.2007.12.096.
| Título: | Combined grazing incidence RBS and TEM analysis of luminescent nano-SiGe/SiO2 multilayers. |
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| Autor/es: |
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| Tipo de Documento: | Artículo |
| Título de Revista/Publicación: | Nuclear Instruments and Methods in Physics Research Section B-Beam Interaction |
| Fecha: | Abril 2008 |
| ISSN: | 0168-583X |
| Volumen: | 266 |
| Número: | 8 |
| Materias: | |
| ODS: | |
| Palabras Clave Informales: | Nanostructure multilayers; SiGe nanoparticles; LPCVD; Grazing incidence RBS; TEM. |
| Escuela: | E.T.S.I. Telecomunicación (UPM) |
| Departamento: | Tecnología Electrónica [hasta 2014] |
| Licencias Creative Commons: | Reconocimiento - Sin obra derivada - No comercial |
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Multilayer structures with five periods of amorphous SiGe nanoparticles/SiO2 layers with different thickness were deposited by Low Pressure Chemical Vapor Deposition and annealed to crystallize the SiGe nanoparticles. The use of grazing incidence RBS was necessary to obtain sufficient depth resolution to separate the signals arising from the individual layers only a few nm thick. The average size and areal density of the embedded SiGe nanoparticles as well as the oxide interlayer thickness were determined from the RBS spectra. Details of eventual composition changes and diffusion processes caused by the annealing processes were also studied. Transmission Electron Microscopy was used to obtain complementary information on the structural parameters of the samples in order to check the information yielded by RBS. The study revealed that annealing at 900 °C for 60 s, enough to crystallize the SiGe nanoparticles, leaves the structure unaltered if the interlayer thickness is around 15 nm or higher.
| ID de Registro: | 2227 |
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| Identificador DC: | https://oa.upm.es/2227/ |
| Identificador OAI: | oai:oa.upm.es:2227 |
| URL Portal Científico: | https://portalcientifico.upm.es/es/ipublic/item/5482930 |
| Identificador DOI: | 10.1016/j.nimb.2007.12.096 |
| URL Oficial: | http://www.elsevier.com/wps/find/journaldescriptio... |
| Depositado por: | Memoria Investigacion |
| Depositado el: | 09 Feb 2010 09:34 |
| Ultima Modificación: | 12 Nov 2025 00:00 |
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