Microfabrication processes for microfluidic devices on a single laser Workstation: direct writing lithography on SU-8, laser ablation on polymers and mask manufacturing

Sanza Gutiérrez, Francisco Javier, Rodríguez, D., Laguna Heras, Maria Fe ORCID: https://orcid.org/0000-0002-1580-4509, Casquel del Campo, Rafael ORCID: https://orcid.org/0000-0003-2433-9159, Lavín Hueros, Álvaro ORCID: https://orcid.org/0000-0001-9981-2372, López, A. and Holgado Bolaños, Miguel ORCID: https://orcid.org/0000-0001-9299-1371 (2013). Microfabrication processes for microfluidic devices on a single laser Workstation: direct writing lithography on SU-8, laser ablation on polymers and mask manufacturing. En: "European Congress and Exhibition on Advanced Materials and Processes (EUROMAT 2013)", 09/09/2013 - 13/09/2013, Sevilla, Spain. p. 1.

Descripción

Título: Microfabrication processes for microfluidic devices on a single laser Workstation: direct writing lithography on SU-8, laser ablation on polymers and mask manufacturing
Autor/es:
Tipo de Documento: Ponencia en Congreso o Jornada (Póster)
Título del Evento: European Congress and Exhibition on Advanced Materials and Processes (EUROMAT 2013)
Fechas del Evento: 09/09/2013 - 13/09/2013
Lugar del Evento: Sevilla, Spain
Título del Libro: Microfabrication processes for microfluidic devices on a single laser Workstation: direct writing lithography on SU-8, laser ablation on polymers and mask manufacturing
Fecha: 2013
Materias:
ODS:
Escuela: Centro Láser (UPM)
Departamento: Otro
Licencias Creative Commons: Reconocimiento - Sin obra derivada - No comercial

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Resumen

We demonstrate the capability of a laser micromachining workstation for cost-effective manufacturing of a variety of microfluidic devices, including SU-8 microchannels on silicon wafers and 3D complex structures made on polyimide Kapton® or poly carbonate (PC). The workstation combines a KrF excimer laser at 248 nm and a Nd3+:YVO4 DPSS with a frequency tripled at 355 nm with a lens magnification 10X, both lasers working at a pulsed regime with nanoseconds (ns) pulse duration.
Workstation also includes a high-resolution motorized
XYZ-tilt axis (~ 1 um / axis) and a Through The Lens (TTL) imaging system for a high accurate positioning over a 120 x 120 mm working area. We have surveyed different fabrication techniques: direct writing lithography,mask manufacturing for contact lithography and polymer laser ablation for
complex 3D devices, achieving width channels down to 13μ
m on 50μ m SU-8 thickness using direct writing lithography, and width channels of 40 μm for polyimide on SiO2 plate.
Finally, we have tested the use of some devices for capillary chips measuring the flow speed for liquids
with different viscosities. As a result, we have characterized the presence of liquid in the channel by
interferometric microscopy.

Más información

ID de Registro: 29794
Identificador DC: https://oa.upm.es/29794/
Identificador OAI: oai:oa.upm.es:29794
Depositado por: Memoria Investigacion
Depositado el: 05 May 2015 16:59
Ultima Modificación: 08 Jul 2024 08:19