Microfabrication processes for microfluidic devices on a single laser Workstation: direct writing lithography on SU-8, laser ablation on polymers and mask manufacturing

Sanza Gutiérrez, Francisco Javier and Rodríguez, D. and Laguna Heras, Maria Fe and Casquel del Campo, Rafael and Lavin Hueros, Alvaro and López, A. and Holgado Bolaños, Miguel (2013). Microfabrication processes for microfluidic devices on a single laser Workstation: direct writing lithography on SU-8, laser ablation on polymers and mask manufacturing. In: "European Congress and Exhibition on Advanced Materials and Processes (EUROMAT 2013)", 09/09/2013 - 13/09/2013, Sevilla, Spain. p. 1.

Description

Title: Microfabrication processes for microfluidic devices on a single laser Workstation: direct writing lithography on SU-8, laser ablation on polymers and mask manufacturing
Author/s:
  • Sanza Gutiérrez, Francisco Javier
  • Rodríguez, D.
  • Laguna Heras, Maria Fe
  • Casquel del Campo, Rafael
  • Lavin Hueros, Alvaro
  • López, A.
  • Holgado Bolaños, Miguel
Item Type: Presentation at Congress or Conference (Poster)
Event Title: European Congress and Exhibition on Advanced Materials and Processes (EUROMAT 2013)
Event Dates: 09/09/2013 - 13/09/2013
Event Location: Sevilla, Spain
Title of Book: Microfabrication processes for microfluidic devices on a single laser Workstation: direct writing lithography on SU-8, laser ablation on polymers and mask manufacturing
Date: 2013
Subjects:
Faculty: Centro Láser (UPM)
Department: Otro
Creative Commons Licenses: Recognition - No derivative works - Non commercial

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Abstract

We demonstrate the capability of a laser micromachining workstation for cost-effective manufacturing of a variety of microfluidic devices, including SU-8 microchannels on silicon wafers and 3D complex structures made on polyimide Kapton® or poly carbonate (PC). The workstation combines a KrF excimer laser at 248 nm and a Nd3+:YVO4 DPSS with a frequency tripled at 355 nm with a lens magnification 10X, both lasers working at a pulsed regime with nanoseconds (ns) pulse duration. Workstation also includes a high-resolution motorized XYZ-tilt axis (~ 1 um / axis) and a Through The Lens (TTL) imaging system for a high accurate positioning over a 120 x 120 mm working area. We have surveyed different fabrication techniques: direct writing lithography,mask manufacturing for contact lithography and polymer laser ablation for complex 3D devices, achieving width channels down to 13μ m on 50μ m SU-8 thickness using direct writing lithography, and width channels of 40 μm for polyimide on SiO2 plate. Finally, we have tested the use of some devices for capillary chips measuring the flow speed for liquids with different viscosities. As a result, we have characterized the presence of liquid in the channel by interferometric microscopy.

More information

Item ID: 29794
DC Identifier: http://oa.upm.es/29794/
OAI Identifier: oai:oa.upm.es:29794
Deposited by: Memoria Investigacion
Deposited on: 05 May 2015 16:59
Last Modified: 05 May 2015 16:59
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