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| Título: | Electrocatalytic oxidation enhancement at the surface of InGaN films and nanostructures grown directly on Si(111) |
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| Autor/es: |
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| Tipo de Documento: | Artículo |
| Título de Revista/Publicación: | Electrochemistry Communications |
| Fecha: | Noviembre 2015 |
| ISSN: | 1388-2481 |
| Volumen: | 60 |
| Materias: | |
| ODS: | |
| Palabras Clave Informales: | InGaN; InN; Quantum dots; Nanocolumns; Nanowall network; Cyclic voltammetry |
| Escuela: | Instituto de Sistemas Optoelectrónicos y Microtecnología (ISOM) (UPM) |
| Departamento: | Otro |
| Licencias Creative Commons: | Reconocimiento - Sin obra derivada - No comercial |
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Pronounced electrocatalytic oxidation enhancement at the surface of InGaN layers and nanostructures directly grown on Si by plasma-assisted molecular beam epitaxy is demonstrated. The oxidation enhancement, probed with the ferro/ferricyanide redox couple increases with In content and proximity of nanostructure surfaces and sidewalls to the c-plane. This is attributed to the corresponding increase of the density of intrinsic positively charged surface donors promoting electron transfer. Strongest enhancement is for c-plane InGaN layers functionalized with InN quantum dots (QDs). These results explain the excellent performance of our InN/InGaN QD biosensors and water splitting electrodes for further boosting efficiency.
| ID de Registro: | 40907 |
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| Identificador DC: | https://oa.upm.es/40907/ |
| Identificador OAI: | oai:oa.upm.es:40907 |
| URL Portal Científico: | https://portalcientifico.upm.es/es/ipublic/item/5492439 |
| Identificador DOI: | 10.1016/j.elecom.2015.09.003 |
| URL Oficial: | http://www.sciencedirect.com/science/article/pii/S... |
| Depositado por: | Memoria Investigacion |
| Depositado el: | 07 Sep 2016 16:34 |
| Ultima Modificación: | 12 Nov 2025 00:00 |
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