Plasma basic concepts and nitrogen containing plasmas

Sanz Lluch, M. del Mar and Tanarro, Isabel (2007). Plasma basic concepts and nitrogen containing plasmas. In: "Nitrides and dilute nitrides: Growth, physics and devices". Transworld Research Network, Trivandrum, India, pp. 15-46. ISBN 978-81-7895-250-5.

Description

Title: Plasma basic concepts and nitrogen containing plasmas
Author/s:
  • Sanz Lluch, M. del Mar
  • Tanarro, Isabel
Item Type: Book Section
Title of Book: Nitrides and dilute nitrides: Growth, physics and devices
Date: 2007
ISBN: 978-81-7895-250-5
Subjects:
Faculty: Otros Centros UPM
Department: Otro
Creative Commons Licenses: Recognition - No derivative works - Non commercial

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Abstract

Basic concepts related to plasmas are described as well as the typical characterization methods currently available. A brief overview about some plasma applications is given, but focusing on plasma used in material processing mainly devoted to the microelectronics industry. Finally, specific applications related to plasma-assisted MBE for nitrides and dilute nitrides are given, showing some interesting research works performed to that purpose, and giving the usual characterization techniques commonly used in such processes.

More information

Item ID: 4806
DC Identifier: http://oa.upm.es/4806/
OAI Identifier: oai:oa.upm.es:4806
Official URL: http://www.trnres.com/
Deposited by: Memoria Investigacion
Deposited on: 04 Nov 2010 11:40
Last Modified: 20 Apr 2016 13:53
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