Plasma basic concepts and nitrogen containing plasmas

Sanz Lluch, M. del Mar ORCID: https://orcid.org/0000-0002-7810-7460 and Tanarro, Isabel (2007). Plasma basic concepts and nitrogen containing plasmas. En: "Nitrides and dilute nitrides: Growth, physics and devices". Transworld Research Network, Trivandrum, India, pp. 15-46. ISBN 978-81-7895-250-5.

Descripción

Título: Plasma basic concepts and nitrogen containing plasmas
Autor/es:
Tipo de Documento: Sección de Libro
Título del Libro: Nitrides and dilute nitrides: Growth, physics and devices
Fecha: 2007
ISBN: 978-81-7895-250-5
Materias:
ODS:
Escuela: Otros Centros UPM
Departamento: Otro
Licencias Creative Commons: Reconocimiento - Sin obra derivada - No comercial

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Resumen

Basic concepts related to plasmas are described as well as the typical characterization methods currently available. A brief overview about some plasma applications is given, but focusing on plasma used in material processing mainly devoted to the microelectronics industry. Finally, specific applications related to plasma-assisted MBE for nitrides and dilute nitrides are given, showing some interesting research works performed to that purpose, and giving the usual characterization techniques commonly used in such processes.

Más información

ID de Registro: 4806
Identificador DC: https://oa.upm.es/4806/
Identificador OAI: oai:oa.upm.es:4806
URL Oficial: http://www.trnres.com/
Depositado por: Memoria Investigacion
Depositado el: 04 Nov 2010 11:40
Ultima Modificación: 20 Abr 2016 13:53