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ORCID: https://orcid.org/0000-0002-7810-7460 and Tanarro, Isabel
(2007).
Plasma basic concepts and nitrogen containing plasmas.
En:
"Nitrides and dilute nitrides: Growth, physics and devices".
Transworld Research Network, Trivandrum, India, pp. 15-46.
ISBN 978-81-7895-250-5.
| Título: | Plasma basic concepts and nitrogen containing plasmas |
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| Autor/es: |
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| Tipo de Documento: | Sección de Libro |
| Título del Libro: | Nitrides and dilute nitrides: Growth, physics and devices |
| Fecha: | 2007 |
| ISBN: | 978-81-7895-250-5 |
| Materias: | |
| ODS: | |
| Escuela: | Otros Centros UPM |
| Departamento: | Otro |
| Licencias Creative Commons: | Reconocimiento - Sin obra derivada - No comercial |
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Basic concepts related to plasmas are described as well as the typical characterization methods currently available. A brief overview about some plasma applications is given, but focusing on plasma used in material processing mainly devoted to the microelectronics industry. Finally, specific applications related to plasma-assisted MBE for nitrides and dilute nitrides are given, showing some interesting research works performed to that purpose, and giving the usual characterization techniques commonly used in such processes.
| ID de Registro: | 4806 |
|---|---|
| Identificador DC: | https://oa.upm.es/4806/ |
| Identificador OAI: | oai:oa.upm.es:4806 |
| URL Oficial: | http://www.trnres.com/ |
| Depositado por: | Memoria Investigacion |
| Depositado el: | 04 Nov 2010 11:40 |
| Ultima Modificación: | 20 Abr 2016 13:53 |
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