Active materials based on implanted Si for obtaining intermediate band solar cells

Sánchez Noriega, Kefrén, Aguilera Bonet, Irene, Palacios Clemente, Pablo ORCID: https://orcid.org/0000-0001-7867-8880 and Wahnón Benarroch, Perla ORCID: https://orcid.org/0000-0002-5420-2906 (2010). Active materials based on implanted Si for obtaining intermediate band solar cells. "Advances in Science and Technology", v. 74 ; pp. 151-156. ISSN 1662-8969. https://doi.org/10.4028/www.scientific.net/AST.74.151.

Descripción

Título: Active materials based on implanted Si for obtaining intermediate band solar cells
Autor/es:
Tipo de Documento: Artículo
Título de Revista/Publicación: Advances in Science and Technology
Fecha: 2010
ISSN: 1662-8969
Volumen: 74
Materias:
ODS:
Palabras Clave Informales: Intermediate band, photovoltaic materials, first-principles calculations, Si
Escuela: Instituto de Energía Solar (IES) (UPM)
Departamento: Otro
Licencias Creative Commons: Reconocimiento - Sin obra derivada - No comercial

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Resumen

First-principles calculations carried out for compounds based on Si implanted with different species, as Ti or chalcogens (S, Se, Te), show them as solid candidates to intermediate band (IB) photovoltaic materials. This DFT study predicts electronic structures, formation energies, relaxed atomic structures, optoelectronic properties,diffusion paths, for supercells containing up to several hundreds of atoms. The knowledge of Si-based devices is a relevant factor to facilitate the creation of an IB solar cell. Crystalline samples with a concentration of Ti several orders of magnitude above the solubility limit have been already grown. Formation energy calculations agree with the experiment in showing mainly interstitial implantation. Calculated electronic structure presents an IB, which is in agreement with electrical measurements and models, and is expected to cause an increase of the absorption coefficient across the solar spectrum. Chalcogen-implanted Si is an efficient IR absorber when implantation is carried out at ultra-high concentrations. Substitutional implantation produces a filled band inside Si band-gap and our calculations predict that plausible co-doping with IIIA atoms (as Al, B) would allow to obtain an IB fulfilling all the needed requirements.

Proyectos asociados

Tipo
Código
Acrónimo
Responsable
Título
Gobierno de España
CSD2006-0004
GENESIS FV
Sin especificar
Sin especificar
Gobierno de España
MAT2009-14625-C03-01
FOTOMAT
Sin especificar
Sin especificar
Comunidad de Madrid
S2009/ENE1477
NUMANCIA 2
Sin especificar
Sin especificar

Más información

ID de Registro: 62348
Identificador DC: https://oa.upm.es/62348/
Identificador OAI: oai:oa.upm.es:62348
Identificador DOI: 10.4028/www.scientific.net/AST.74.151
URL Oficial: https://www.scientific.net/AST.74.151
Depositado por: Biblioteca ETSI Telecomunicación
Depositado el: 25 Mar 2020 07:19
Ultima Modificación: 30 Nov 2022 09:00